A study on the effect of Ti target poisoning to TiN coating deposited by a DC magnetron sputtering

The DC magnetron sputtering is often used for fabricating thin hard coatings for a wide range of industrial applications. The technique allows using DC power for deposition low or non-conductive films from metal target without using expensive RF power for insulation target. However, the performance of DC reactive sputtering is affected significantly by a phenomenon namely target poisoning. When the target poisoning occurs, coating is formed not only on substrate surface but also on target surface, which results in the reduction of deposition rate and coating properties.

Từ khóa: ti target, poisoning, TiN, reactive gas, adhesion

7 p ovanketv 07/06/2019 459 2

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